A Chemical Approach to 3-D Lithographic Patterning of Si...

MRS Proceedings 2005 / 1 Vol. 901

A Chemical Approach to 3-D Lithographic Patterning of Si and Ge Nanocrystals

Sharp, I. D., Xu, Q., Yi, D. O., Liao, C. Y., Ager III, J. W., Beeman, J. W., Yu, K. M., Robinson, J. T., Dubon, O. D., Chrzan, D. C., Haller, E. E.
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Volume:
901
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0901-Rb09-03
Date:
January, 2005
File:
PDF, 377 KB
english, 2005
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