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Patterning of permalloy thin films by means of electron-beam lithography and focused ion-beam milling
S. Getlawi, M.R. Koblischka, U. Hartmann, C. Richter, T. SulzbachVolume:
44
Year:
2008
Language:
english
Pages:
6
DOI:
10.1016/j.spmi.2007.12.009
File:
PDF, 915 KB
english, 2008