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Dissolution Rate of Colloidal Silica in Highly Alkaline Solution
Chida, Taiji, Niibori, Yuichi, Tochiyama, Osamu, Mimura, Hitoshi, Tanaka, KoichiVolume:
824
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-824-cc8.39
Date:
January, 2004
File:
PDF, 483 KB
english, 2004