Electrical Characterization of Deposited and Oxidized Ta2Si as Dielectric Film for SiC Metal-Insulator-Semiconductor Structures
Pérez-Tomás, Amador, Tournier, Dominique, Montserrat, Josep, Mestres, Narcis, Sandiumenge, F., Millán, JoséVolume:
457-460
Year:
2004
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.457-460.845
File:
PDF, 339 KB
english, 2004