Defectivity Reduction in the Silicon Tough Polishing with...

Advanced Materials Research 2011 / 11 Vol. 396-398

Defectivity Reduction in the Silicon Tough Polishing with Polyamine and Nonions Surfactant Additives

Sun, Ming, Tan, Bai Mei, Niu, Xin Huan, Wang, Juan, He, Yan Gang, Liu, Yu Ling, Wang, Na, Gao, Bao Hong
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Volume:
396-398
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.396-398.390
Date:
November, 2011
File:
PDF, 293 KB
english, 2011
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