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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Mechanical and thermal properties of nanomaterials at sub-50nm dimensions characterized using coherent EUV beams
Cain, Jason P., Sanchez, Martha I., Hoogeboom-Pot, Kathleen, Hernandez-Charpak, Jorge, Frazer, Travis, Gu, Xiaokun, Turgut, Emrah, Anderson, Erik, Chao, Weilun, Shaw, Justin, Yang, Ronggui, Murnane, MVolume:
9424
Year:
2015
Language:
english
DOI:
10.1117/12.2085615
File:
PDF, 558 KB
english, 2015