Effect of N2 Flow Rate on Structure and Morphology of (Ti,Cr)N Thin Films Deposited by Unbalanced Magnetron Co-Sputtering
Paksunchai, Chutima, Denchitcharoen, Somyod, Chaiyakun, Surasing, Limsuwan, PichetVolume:
488-489
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.488-489.432
Date:
March, 2012
File:
PDF, 5.05 MB
english, 2012