Wet Chemical Etching of InP for Cleaning Applications: I....

ECS Journal of Solid State Science and Technology 2013 / 02 Vol. 2; Iss. 4

Wet Chemical Etching of InP for Cleaning Applications: I. An Oxide Formation/Oxide Dissolution Model

Cuypers, D., De Gendt, S., Arnauts, S., Paulussen, K., van Dorp, D. H.
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Volume:
2
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.020304jss
Date:
February, 2013
File:
PDF, 922 KB
english, 2013
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