Titanium Hafnium Oxide Alloy Films by a Novel Sub-Atomic Layer Sputtering Process for High Index and Graded Index Applications
Kobayashi, Nobuhiko P., Demaray, R. Ernest, Zhang, Junce, Norris, Kate J., Fryauf, David M., Díaz León, Juan J., Flores, Amanda, Mullapdi, Ravi, Arunagiri, Tana, Lu, LaiVolume:
1565
Year:
2013
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2013.1089
File:
PDF, 811 KB
english, 2013