Low-damage Preparation of SiO2 Dielectric Thin Film by the Photo-assisted Oxidation Processing
Kodzasa, Takehito, Uemura, Sei, Suemori, Kouji, Yoshida, Manabu, Hoshino, Satoshi, Takada, Noriyuki, Kamata, ToshihideVolume:
1287
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2011.1143
Date:
January, 2011
File:
PDF, 644 KB
english, 2011