Epitaxy of High Quality SiC Layers by CST
Yoshida, Takeru, Nishio, Y., Lilov, S.K., Nishino, ShigehiroVolume:
264-268
Year:
1998
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.264-268.155
File:
PDF, 395 KB
1998