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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Effect of nanoscale confinement on the diffusion behavior of photoresist polymer thin films
Singh, Lovejeet, Ludovice, Peter J., Henderson, Clifford L., Sturtevant, John L.Volume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.535333
File:
PDF, 290 KB
english, 2004