SPIE Proceedings [SPIE Microelectronics, MEMS, and Nanotechnology - Perth, Australia (Tuesday 9 December 2003)] Device and Process Technologies for MEMS, Microelectronics, and Photonics III - Atomic layer deposition (ALD) of TiO2 and Al2O3 thin films on silicon
Mitchell, David R. G., Triani, Gerry, Attard, Darren J., Finnie, Kim S., Evans, Peter J., Barbe, Christophe J., Bartlett, John R., Chiao, Jung-Chih, Hariz, Alex J., Jamieson, David N., Parish, GiacintVolume:
5276
Year:
2004
Language:
english
DOI:
10.1117/12.531795
File:
PDF, 1.13 MB
english, 2004