High-k-oxide/silicon interfaces characterized by capacitance frequency spectroscopy
B. Raeissi, J. Piscator, O. Engström, S. Hall, O. Buiu, M.C. Lemme, H.D.B. Gottlob, P.K. Hurley, K. Cherkaoui, H.J. OstenVolume:
52
Year:
2008
Language:
english
Pages:
6
DOI:
10.1016/j.sse.2008.04.005
File:
PDF, 350 KB
english, 2008