Effect of dopants on the epitaxial growth and oxygen diffusion behaviors of CeO2−δ buffer layer for coated conductors
Wang, H., Cao, L. Y., Wang, Y., Jin, L. H., Liu, J. Y., Huang, J. F., Li, C. S.Volume:
26
Language:
english
Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-015-2914-6
Date:
June, 2015
File:
PDF, 1.42 MB
english, 2015