In-situ post deposition annealing of lead-free ferroelectric thin films in oxygen rich atmosphere
Mahesh, M. L. V., James, A. R., Bhanu Prasad, V. V.Volume:
26
Language:
english
Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-015-3004-5
Date:
July, 2015
File:
PDF, 681 KB
english, 2015