Fabrication of hollow thin films of yttria-stabilized...

Solid State Ionics 2006 Vol. 177; Iss. 33-34

Fabrication of hollow thin films of yttria-stabilized zirconia by chemical vapor infiltration using NiO as oxygen source

Kenji Kikuchi, Kazuaki Matsuo, Atsushi Mineshige, Zempachi Ogumi
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Volume:
177
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.ssi.2006.08.024
File:
PDF, 1.01 MB
english, 2006
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