Comparative study of global warming effects during silicon nitride etching using C3F6O/O2and C3F6/O2gas mixtures
Kim, Ka Youn, Moon, Hock Key, Lee, Nae-Eung, Hong, Bo Han, Oh, Soo HoVolume:
11
Language:
english
Journal:
Electronic Materials Letters
DOI:
10.1007/s13391-014-4080-z
Date:
January, 2015
File:
PDF, 812 KB
english, 2015