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Utilization of Si atomic steps for Cu nanowire fabrication
Ryu Hasunuma, Takanobu Yada, Junichi Okamoto, Daisuke Hojo, Norio Tokuda, Kikuo YamabeVolume:
6
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.stam.2005.05.005
File:
PDF, 162 KB
english, 2005