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Interface reactions at TiN/HfSiON gate stacks: Dependence on the electrode structure and deposition method
Shiniti Yoshida, Yasumasa Watanabe, Yuuki Kita, Takayoshi Shimura, Heiji Watanabe, Kiyoshi Yasutake, Yasushi Akasaka, Yasuo Nara, Keisaku YamadaVolume:
8
Year:
2007
Language:
english
Pages:
6
DOI:
10.1016/j.stam.2006.12.007
File:
PDF, 579 KB
english, 2007