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Simulation of the polymerization process on a silicon surface under plasma-chemical etching in CF4/H2
Grigoryev, Yu. N., Gorobchuk, A. G.Volume:
9
Language:
english
Journal:
Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
DOI:
10.1134/S1027451015010309
Date:
January, 2015
File:
PDF, 240 KB
english, 2015