Oxidation precursor dependence of atomic layer deposited...

Nanoscale Research Letters 2015 / 12 Vol. 10; Iss. 1

Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks

Xiang, Yuren, Zhou, Chunlan, Jia, Endong, Wang, Wenjing
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Volume:
10
Language:
english
Journal:
Nanoscale Research Letters
DOI:
10.1186/s11671-015-0798-2
Date:
December, 2015
File:
PDF, 1.78 MB
english, 2015
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