Characteristics of a nickel thin film and formation of...

Characteristics of a nickel thin film and formation of nickel silicide by using remote plasma atomic layer deposition with Ni(iPr-DAD)2

Kim, Jinho, Jang, Woochool, Park, Jingyu, Jeon, Heeyoung, Kim, Hyunjung, Yuh, Junhan, Jeon, Hyeongtag
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Volume:
66
Language:
english
Journal:
Journal of the Korean Physical Society
DOI:
10.3938/jkps.66.821
Date:
March, 2015
File:
PDF, 1.10 MB
english, 2015
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