Characteristics of a nickel thin film and formation of nickel silicide by using remote plasma atomic layer deposition with Ni(iPr-DAD)2
Kim, Jinho, Jang, Woochool, Park, Jingyu, Jeon, Heeyoung, Kim, Hyunjung, Yuh, Junhan, Jeon, HyeongtagVolume:
66
Language:
english
Journal:
Journal of the Korean Physical Society
DOI:
10.3938/jkps.66.821
Date:
March, 2015
File:
PDF, 1.10 MB
english, 2015