SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Photocurable silicon-based materials for imprinting lithography
Hao, Jianjun, Lin, Michael W., Palmieri, Frank, Nishimura, Yukio, Chao, Huang-Lin, Stewart, Michael D., Collins, Austin, Jen, Kane, Willson, C. Grant, Lercel, Michael J.Volume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.712261
File:
PDF, 1.02 MB
english, 2007