Deposition of SiO2 films by low-energy ion-beam induced...

Surface and Coatings Technology 2004 Vol. 177-178; Iss. none

Deposition of SiO2 films by low-energy ion-beam induced chemical vapor deposition using hexamethyldisiloxane

Takaomi Matsutani, Tatsuya Asanuma, Chang Liu, Masato Kiuchi, Takae Takeuchi
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Volume:
177-178
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2003.09.028
File:
PDF, 229 KB
english, 2004
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