![](/img/cover-not-exists.png)
Deposition mechanism and structural characterization of TiO2 films produced using ESAVD method
Xianghui Hou, Kwang-Leong ChoyVolume:
180-181
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2003.10.023
File:
PDF, 618 KB
english, 2004