Effect of Low Power Deposition and Low Oxidation...

MRS Proceedings 2012 / 1 Vol. 1394

Effect of Low Power Deposition and Low Oxidation Temperature on the Interfacial and Structural Properties of sputtered HfO2 Gate Dielectrics

Minko, Auxence, Belo, Gustavo S., Rudenja, Sergei, Buchanan, Douglas A.
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Volume:
1394
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2012.802
Date:
January, 2012
File:
PDF, 943 KB
english, 2012
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