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Influence of process parameters on the properties of TEOS–PECVD-grown SiO2 films
A.M. Mahajan, L.S. Patil, D.K. GautamVolume:
188-189
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2004.08.051
File:
PDF, 423 KB
english, 2004