Growth mechanisms of SiO2 thin films prepared by plasma...

Surface and Coatings Technology 2005 Vol. 200; Iss. 1-4

Growth mechanisms of SiO2 thin films prepared by plasma enhanced chemical vapour deposition

A. Yanguas-Gil, J. Cotrino, F. Yubero, A.R. González-Elipe
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Volume:
200
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2005.01.070
File:
PDF, 227 KB
english, 2005
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