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Structure and mechanical properties of Ti–Al films deposited by magnetron sputtering
J.C. Oliveira, A. Manaia, J.P. Dias, A. Cavaleiro, D. Teer, S. TaylorVolume:
200
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2005.01.078
File:
PDF, 141 KB
english, 2005