Increasing the deposition rate of oxide films by increasing...

Increasing the deposition rate of oxide films by increasing the plasma reactivity

R. Snyders, R. Gouttebaron, J.P. Dauchot, M. Hecq
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Volume:
200
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2005.02.067
File:
PDF, 143 KB
english, 2005
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