Increasing the deposition rate of oxide films by increasing the plasma reactivity
R. Snyders, R. Gouttebaron, J.P. Dauchot, M. HecqVolume:
200
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2005.02.067
File:
PDF, 143 KB
english, 2005