Single source precursors for plasma-enhanced CVD of SiCN...

Surface and Coatings Technology 2005 Vol. 200; Iss. 1-4

Single source precursors for plasma-enhanced CVD of SiCN films, investigated by mass spectrometry

Th. Stelzner, M. Arold, F. Falk, H. Stafast, D. Probst, H. Hoche
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Volume:
200
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2005.02.077
File:
PDF, 259 KB
english, 2005
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