Selective Chemical Mechanical Polishing of Silicon Dioxide over Silicon Nitride for Shallow Trench Isolation Using Ceria Slurries
Dandu Veera, P. R., Peddeti, Shivaji, Babu, S. V.Volume:
156
Year:
2009
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3230624
File:
PDF, 641 KB
english, 2009