Control of Etch Slope during Etching of Pt in...

Japanese Journal of Applied Physics 1996 / 4 Vol. 35; Iss. Part 1, No

Control of Etch Slope during Etching of Pt in A r / C l 2 / O 2 Plasmas

Yoo, Won Jong, Hahm, Jin Hwan, Kim, Hyoun Woo, Jung, Chan Ouk, Koh, Young Bum, Lee, Moon Yong
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.2501
Date:
April, 1996
File:
PDF, 990 KB
1996
Conversion to is in progress
Conversion to is failed