N-rich Zr–N films deposited by unbalanced magnetron...

Surface and Coatings Technology 2006 Vol. 200; Iss. 16-17

N-rich Zr–N films deposited by unbalanced magnetron sputtering enhanced with a highly reactive MW-ECR plasma

Zhang Zhiguo, Liu Tianwei, Xu Jun, Deng Xinlu, Dong Chuang
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Volume:
200
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2005.04.060
File:
PDF, 201 KB
english, 2006
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