Formation of amine groups by plasma enhanced chemical vapor...

Surface and Coatings Technology 2006 Vol. 200; Iss. 9

Formation of amine groups by plasma enhanced chemical vapor deposition and its application to DNA array technology

Donggeun Jung, Sanghak Yeo, Jinmo Kim, Bongjun Kim, Bohwan Jin, Doug-Young Ryu
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Volume:
200
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.surfcoat.2005.08.007
File:
PDF, 349 KB
english, 2006
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