The structure and hardness of magnetron sputtered Ti–Al–N thin films with low N contents (
J.C. Oliveira, A. Manaia, J.P. Dias, A. Cavaleiro, D. Teer, S. TaylorVolume:
200
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2005.11.051
File:
PDF, 166 KB
english, 2006