Electromigration in Aluminum Based Interconnects of VLSI-Microcircuits, with and without Preceding Stress-Migration Damage
Korhonen, M. A., Børgesen, P., Li, Che-YuVolume:
239
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-239-695
Date:
January, 1991
File:
PDF, 387 KB
english, 1991