Electromigration in Aluminum Based Interconnects of...

Electromigration in Aluminum Based Interconnects of VLSI-Microcircuits, with and without Preceding Stress-Migration Damage

Korhonen, M. A., Børgesen, P., Li, Che-Yu
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Volume:
239
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-239-695
Date:
January, 1991
File:
PDF, 387 KB
english, 1991
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