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The effects of nitrogen partial pressure on the properties of the TaNx films deposited by reactive magnetron sputtering
Ta-Ching Li, Ben-Je Lwo, Nen-Wen Pu, Shih-Piao Yu, Chin-Hsing KaoVolume:
201
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.surfcoat.2006.01.013
File:
PDF, 260 KB
english, 2006