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Thermal diffusion behavior of implanted germanium atoms in silicon dioxide film measured by high-resolution RBS
Nobutoshi Arai, Hiroshi Tsuji, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo IshikawaVolume:
201
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2006.01.089
File:
PDF, 1.05 MB
english, 2007