Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation
A.P. Huang, Z.F. Di, Ricky K.Y. Fu, Paul K. ChuVolume:
201
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2006.09.330
File:
PDF, 797 KB
english, 2007