Improvement of interfacial and microstructure properties of...

Improvement of interfacial and microstructure properties of high-k ZrO2 thin films fabricated by filtered cathodic arc deposition using nitrogen incorporation

A.P. Huang, Z.F. Di, Ricky K.Y. Fu, Paul K. Chu
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Volume:
201
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2006.09.330
File:
PDF, 797 KB
english, 2007
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