A Novel Method of Sputter Deposition Utilizing a...

Japanese Journal of Applied Physics 1990 / 5 Vol. 29; Iss. Part 2, No

A Novel Method of Sputter Deposition Utilizing a Hot-Cathode Penning Ion Source

Shoji, Fumiya, Oura, Kenjiro
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L812
Date:
May, 1990
File:
PDF, 425 KB
1990
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