Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (Silcore®) embedded in ALD-alumina for non-volatile memory devices
I. Brunets, A.A.I. Aarnink, A. Boogaard, A.Y. Kovalgin, R.A.M. Wolters, J. Holleman, J. SchmitzVolume:
201
Year:
2007
Language:
english
Pages:
6
DOI:
10.1016/j.surfcoat.2007.03.035
File:
PDF, 917 KB
english, 2007