Single source precursor-based HV-MOCVD deposition of binary...

Surface and Coatings Technology 2007 Vol. 201; Iss. 22-23

Single source precursor-based HV-MOCVD deposition of binary group 13-antimonide thin films

Stephan Schulz, Sonja Fahrenholz, Daniella Schuchmann, Andreas Kuczkowski, Wilfried Assenmacher, Frank Reilmann, Naoufal Bahlawane, Katharina Kohse-Höinghaus
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Volume:
201
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.surfcoat.2007.03.045
File:
PDF, 1.82 MB
english, 2007
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