LI-MOCVD of HfO2 thin films using engineered amide based Hf...

Surface and Coatings Technology 2007 Vol. 201; Iss. 22-23

LI-MOCVD of HfO2 thin films using engineered amide based Hf precursors

Andrian Milanov, Reji Thomas, Malte Hellwig, Klaus Merz, Hans-Werner Becker, Peter Ehrhart, Roland A. Fischer, Rainer Waser, Anjana Devi
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Volume:
201
Year:
2007
Language:
english
Pages:
8
DOI:
10.1016/j.surfcoat.2007.04.055
File:
PDF, 1.33 MB
english, 2007
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