Highly Thermal-Stable Amorphous TaSi[sub 2]C[sub x] Films as Diffusion Barrier
Lin, Ting-Yi, Cheng, Huai-Yu, Chin, Tsung-Shune, Chiu, Chin-Fu, Fang, Jau-ShiungVolume:
155
Year:
2008
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2819625
File:
PDF, 635 KB
english, 2008