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Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide
K. Sarakinos, J. Alami, C. Klever, M. WuttigVolume:
202
Year:
2008
Language:
english
Pages:
3
DOI:
10.1016/j.surfcoat.2008.05.009
File:
PDF, 337 KB
english, 2008