Process stabilization and enhancement of deposition rate...

Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide

K. Sarakinos, J. Alami, C. Klever, M. Wuttig
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Volume:
202
Year:
2008
Language:
english
Pages:
3
DOI:
10.1016/j.surfcoat.2008.05.009
File:
PDF, 337 KB
english, 2008
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