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Temperature effect on charge density of silicon nitride films deposited in SiH4–NH3–N2 plasma
Byungwhan Kim, Sang Hee KwonVolume:
202
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2008.06.030
File:
PDF, 592 KB
english, 2008