Interface structure of microcrystalline silicon deposited...

Surface and Coatings Technology 2008 Vol. 202; Iss. 22-23

Interface structure of microcrystalline silicon deposited by inductive coupled plasma using internal low inductance antenna

H. Kaki, A. Tomyo, E. Takahashi, T. Hayashi, K. Ogata, A. Ebe, K. Takenaka, Y. Setsuhara
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Volume:
202
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2008.06.042
File:
PDF, 777 KB
english, 2008
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