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Electrically insulating Al2O3 and SiO2 films for sensor and photovoltaic applications deposited by reactive pulse magnetron sputtering, hollow cathode arc activated deposition and magnetron-PECVD
P. Frach, H. Bartzsch, D. Glöß, M. Fahland, F. HändelVolume:
202
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.surfcoat.2008.06.043
File:
PDF, 380 KB
english, 2008